Effects of organic additives on initial stages of zinc electroplating on iron

Journal of the Electrochemical Society

Volumn 151, Issue 1, 2004, Pages

  Lee, Joo Yul ^a   Kim, Jae Woo ^a,c   Lee, Min Kyu ^a   Shin, Hyun Joon ^a   Kim, Hyun Tae ^b   Park, Su Moon ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b POSCO   (South Korea)

^c NASA LANGLEY RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ADDITIVES; COMPOSITION EFFECTS; CYCLIC VOLTAMMETRY; ELECTRODES; ENERGY DISPERSIVE SPECTROSCOPY; IRON; POLYETHYLENE GLYCOLS; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS; X RAY SPECTROSCOPY; ZINC;

BENZOIC ACID; ORGANIC ADDITIVES; X RAY ABSORPTION SPECTROSCOPY; ZINC CHLORIDE; ZINC ELECTROPLATING;

ELECTROPLATING;

EID: 0842290051     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1627344     Document Type: Article

References (53)

1. R. Renuka, S. Ramamurthy, and K. Muralidharan, J. Power Sources, 20, 197 (1998).
2. J. J. Kelly, C. Tian, and A. C. West, J. Electrochem. Soc., 146, 2540 (1999).
3. F. Ganne, C. Cachet, G. Maurin, R. Wiart, E. Chauveau, and J. Petitjean, J. Appl. Electrochem., 30, 665 (2000).
4. J.-R. Park and H.-T. Kim, Plat. Surf. Finish., 86, 108 (1999).
5. T. Soanda, H. Nawafune, and S. Mizumoto, Plat. Surf. Finish., 79, 79 (1992).
6. C. Bozhkov, M. Petrova, and S. Rashkov, J. Appl. Electrochem., 20, 17 (1990).
7. S. Rashkov, M. Petrova, and C. Bozhkov, J. Appl. Electrochem., 20, 11 (1990).
8. R. Wiart, C. Cachet, C. Bozhkov, and S. Rashkov, J. Appl. Electrochem., 20, 381 (1990).
9. C. Cachet and R. Wiart, J. Appl. Electrochem., 20, 1009 (1990).
10. C. Cachet and R. Wiart, Electrochim. Acta, 44, 4743 (1999).
11. P. Waszczuk, P. Zelenay, and J. Sobkowski, Electrochim. Acta, 43, 14 (1998).
12. Y.-M. Wang, T. J. O'Keefe, and W. J. James, J. Electrochem. Soc., 127, 2589 (1980).
13. C. Cachet and R. Wiart, J. Electrochem. Soc., 141, 161 (1994).
14. C. Cachet, R. Wiart, I. Ivanov, and S. Rashkov, J. Appl. Electrochem., 23, 1011 (1993).
15. I. Epelboin, M. Ksouri, and R. Wiart, J. Electrochem. Soc., 122, 1206 (1975).
16. I. Zouari and F. Lapicque, Electrochim. Acta, 37, 439 (1992).
17. Advances in Electrochemistry and Electrochemical Engineering, Vol. 11, H. Gerischer and C. W. Tobias, Editors, Wiley-Interscience, New York (1978).
18. S. Trasatti, J. Electroanal. Chem. Interfacial Electrochem., 33, 351 (1971).
19. D. Kolb, M. Przasnyski, and H. Gerischer, J. Electroanal. Chem. Interfacial Electrochem., 54, 25 (1974).
20. S. Takahashi, K. Hasebe, and A. Aramata, Electrochem. Commun., 1, 301 (1999).
21. A. Aramata, S. Taguchi, T. Fukuda, M. Nakamura, and G. Horanyi, Electrochim. Acta, 44, 999 (1998).
22. S. Taguchi and A. Aramata, J. Electroanal. Chem., 457, 73 (1998).
23. S. Taguchi, A. Aramata, M. A. Auaiyyum, and M. Enyo, J. Electroanal. Chem., 374, 275 (1994).
24. S. Taguchi and A. Aramata, J. Electroanal. Chem., 396, 131 (1995).
25. M. A. Quaiyyum, A. Aramata, S. Moniwa, S. Taguchi and M. Enyo, J. Electroanal. Chem., 373, 61 (1994).
26. S. Moniwa and A. Aramata, J. Electroanal. Chem., 376, 203 (1994).
27. S. Taguchi, T. Fukuda, and A. Aramata, J. Electroanal. Chem., 435, 55 (1997).
28. M. Nakamura, A. Aramata, A. Yamagishi, and M. Taniguchi, J. Electroanal. Chem., 446, 227 (1996).
29. A. A. El-Shafei, J. Electroanal. Chem., 380, 269 (1995).
30. S. Rashkov, C. Bozhkov, V. Kudryavtsev, K. Pedan, and S. Bagaev, J. Electroanal. Chem., 248, 421 (1988).
31. B. N. Popov, G. Zheng, and R. E. White, Corros. Sci., 36, 2139 (1994).
32. B. A. Boukamp, Equivalent Circuit User's Manual, 2nd ed., University of Twente, Enschede, the Netherlands (1989).
33. B. J. Johnson and S.-M. Park, J. Electrochem. Soc., 143, 1269 (1996).
34. M. Cai and S.-M. Park, J. Electrochem. Soc., 144, 2573 (1997).
35. D. K. Cha and S.-M. Park, J. Electrochem. Soc., 144, 2573 (1997).
36. M.-K. Lee and H.-J. Shin, Nucl. Instrum. Methods Phys. Res. A, 467-468, 508 (2001).
37. J. G. Chen, B. Fruehberger, and M. L. Colainnani, J. Vac. Sci. Technol. A, 14, 1668 (1996).
38. N. Kerr Del Grande, Phys. Scr., 41, 110 (1990).
39. R. Singh and T. O'Keefe, J. Electrochem. Soc., 132, 2898 (1985).
40. D. Mackinnon, J. Brannen, and P. Fenn, J. Appl. Electrochem., 17, 1129 (1987).
41. A. Aragon, M. G. Figueroa, R. E. Gana, and J. H. Zagal, J. Appl. Electrochem., 22, 558 (1992).
42. D.-H. Wang, F.-X. Gan, and J.-Y. Zou, Electrochim. Acta, 43, 2241 (1998).
43. J.-W. Kim, J.-Y. Lee, and S.-M. Park, Langmuir, In press.
44. F. M. F. de Groot, J. Electron Spectrosc. Relat. Phenom., 67, 529 (1994).
45. J. G. Chen, Surf. Sci. Rep., 30, 1 (1997).
46. F. M. F. de Groot, M. Grioni, J. C. Fuggle, J. Ghijsen, G. A. Sawatzky, and H. Petersen, Phys. Rev. B, 40, 5715 (1989).
47. P. Kuiper, B. G. Searle, P. Rudolf, L. H. Tjeng, and C. T. Chen, Phys. Rev. Lett., 70, 1549 (1993).
48. Advances in Electrochemistry and Electrochemical Engineering, Vol. 3, P. Delahy and C. W. Tobias, Editors, Interscience, New York (1963).
49. J. L. Dawson and D. G. John, J. Electroanal. Chem. Interfacial Electrochem., 110, 37 (1980).
50. M. Keddam, O. R. Mattos, and H. Takenouti, J. Electrochem. Soc., 128, 257 (1981).
51. M. Itagaki, M. Tagaki, and K. Watanabe, Electrochim. Acta, 41, 1201 (1996).
52. S. Manov, A. M. Lamazouere, and L. Aries, Corros. Sci., 42, 1235 (2000).
53. G. P. Cicileo, B. M. Rosales, F. E. Varela, and J. R. Vilche, Corros. Sci., 41, 1359 (1999).