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Volumn 15, Issue 1, 2004, Pages 35-43

Defect detection in unpolished Si wafers by digital shearography

Author keywords

COPs; Digital shearography; Semiconductor defect detection

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; CRYSTAL STRUCTURE; IMAGE PROCESSING; POLISHING; SHEARING; TRANSISTORS;

EID: 0742322447     PISSN: 09570233     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-0233/15/1/005     Document Type: Article
Times cited : (37)

References (12)
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  • 2
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    • Shearography: A novel and practical approach for non-destructive inspection
    • Hung Y Y 1989 Shearography: a novel and practical approach for non-destructive inspection J. Nondestruct. Eval. 8 55-66
    • (1989) J. Nondestruct. Eval. , vol.8 , pp. 55-66
    • Hung, Y.Y.1
  • 5
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    • ed H R Huff and E Sirtl (Pennington, NJ: The Electrochemical Society)
    • Rozgonyi G A 1977 Semiconductor Silicon/1977, PV-77-2 ed H R Huff and E Sirtl (Pennington, NJ: The Electrochemical Society) pp 504-8
    • (1977) Semiconductor Silicon/1977, PV-77-2 , pp. 504-508
    • Rozgonyi, G.A.1
  • 6
    • 85034737644 scopus 로고
    • ed H R Huff, U Gosele and H Tsuya (Pennington, NJ: The Electrochemical Society)
    • Fabry L and Matsushita Y 1988 Semiconductor Silicon/1988, PV-98-1 ed H R Huff, U Gosele and H Tsuya (Pennington, NJ: The Electrochemical Society) pp 1459-63
    • (1988) Semiconductor Silicon/1988, PV-98-1 , pp. 1459-1463
    • Fabry, L.1    Matsushita, Y.2
  • 8
    • 0343457938 scopus 로고    scopus 로고
    • Current trends in silicon defect technology
    • Murray Bullis W 2000 Current trends in silicon defect technology Mater. Sci. Eng. B 72 93-8
    • (2000) Mater. Sci. Eng. B , vol.72 , pp. 93-98
    • Murray Bullis, W.1
  • 9
    • 85034784436 scopus 로고    scopus 로고
    • Semiconductor International
    • Semiconductor International http://www.semiconductor.net/semic
  • 10
    • 0002809742 scopus 로고    scopus 로고
    • Digital shearography and applications
    • ed P K Rastogi and D Inaudi (Amsterdam: Elsevier)
    • Hung Y Y 2000 Digital shearography and applications Trends in Optical Non-destructive Testing and Inspection ed P K Rastogi and D Inaudi (Amsterdam: Elsevier) pp 287-308
    • (2000) Trends in Optical Non-destructive Testing and Inspection , pp. 287-308
    • Hung, Y.Y.1
  • 11
    • 0742269072 scopus 로고    scopus 로고
    • Project Thesis School of Mechanical and Production Engineering, Nanayang Technological University, Singapore
    • Monika C H 2003 Characterisation of defects in Si-wafers FYP Project Thesis School of Mechanical and Production Engineering, Nanayang Technological University, Singapore
    • (2003) Characterisation of Defects in Si-Wafers FYP
    • Monika, C.H.1
  • 12
    • 85034783843 scopus 로고    scopus 로고
    • On the way to experimental modal analysis by means of digital shearograpy
    • ed P K Rastogi and D Inaudi (Amsterdam: Elsevier)
    • Steinchen W, Kupfer G, Mäckel P and Vössing F 2000 On the way to experimental modal analysis by means of digital shearograpy Trends in Optical Non-destructive Testing and Inspection vol 21, ed P K Rastogi and D Inaudi (Amsterdam: Elsevier) pp 309-22
    • (2000) Trends in Optical Non-destructive Testing and Inspection , vol.21 , pp. 309-322
    • Steinchen, W.1    Kupfer, G.2    Mäckel, P.3    Vössing, F.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.