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Journal of Applied Physics

Volumn 95, Issue 2, 2004, Pages 640-645

Formation and charging effect of Si nanocrystals in a-SiNx/ a-Si/a-SiNx structures

(8) Dai, Min a Chen, Kai a Huang, Xinfan a Wu, Liangcai a Zhang, Lin a Qiao, Feng a Li, Wei a Chen, Kunji a

a NANJING UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CAPACITANCE MEASUREMENT; CRYSTALLIZATION; ELECTRON ENERGY LEVELS; GRAIN SIZE AND SHAPE; HYSTERESIS; MIS DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SANDWICH STRUCTURES; SEMICONDUCTOR QUANTUM DOTS; SILICON NITRIDE; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; VOLTAGE MEASUREMENT;

CAPACITANCE-VOLTAGE MEASUREMENTS; SINGLE-ELECTRON MEMORY DEVICES;

NANOSTRUCTURED MATERIALS;

EID: 0742320698 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1633649 Document Type: Article

Times cited : (26)

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