Analysis of AC magnetic properties in SiFe laminations under DC-biased magnetisation

Physica B: Condensed Matter

Volumn 343, Issue 1-4, 2004, Pages 127-131

  Barbisio, Edoardo ^a   Bottauscio, Oriano ^b   Chiampi, Mario ^a   Ragusa, Carlo ^a  

^a POLITECNICO DI TORINO   (Italy)

^b ISTITUTO ELETTROTECNICO NAZIONALE GALILEO FERRARIS   (Italy)

Author keywords

DC biased magnetisation; Finite element method; Hysteresis model; Measuring method

Indexed keywords

DEMAGNETIZATION; FINITE ELEMENT METHOD; LAMINATING; MAGNETIC FLUX; MAGNETIC HYSTERESIS; MAGNETIC VARIABLES MEASUREMENT; MAGNETIZATION;

DC BASED MAGNETIZATION; HYSTERESIS MODEL; SPATIAL DISTRIBUTION;

SILICON COMPOUNDS;

EID: 0742304593     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2003.08.083     Document Type: Conference Paper

References (7)

1. Takada S., Yasuda T., Sasaki T. J. Magn. Magn. Mater. 157-158:1996;455.
2. Yanase S., Okazaki Y., Asano T. J. Magn. Magn. Mater. 215-216:2000;156.
3. Enokizono M., Takeshima Y. J. Magn. Magn. Mater. 215-216:2000;704.
4. Leibovic K.N. IEEE Trans. Automat. Control. 9:1964;393.
5. Bottauscio O., Chiampi M., Dupré L.R., Repetto M., Melkebeek J.A.A. IEEE Trans. Mag. 35:1999;4171.
6. Hantila I.F. Rev. Roum. Sci. Techn. - Electrotechn. Energ. 20:1975;397.
7. Ragusa C. J. Magn. Magn. Mater. 254-255:2003;259.