Lonsdaleite Diamond Growth on Reconstructed Si (100) by Hot-Filament Chemical Vapor Deposition (HFCVD)

Korean Journal of Chemical Engineering

Volumn 20, Issue 6, 2003, Pages 1154-1157

  Van Chiem, Chu ^a   Seo, Hyung Kee ^a   Ansari, Shafeeque G ^a   Kim, Gil Sung ^a   Seo, Jae Myung ^a   Shin, Hyung Shik ^a  

^a Chonbuk National University   (South Korea)

Author keywords

Diamond; HFCVD; Lonsdaleite; Surface Reconstruction

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ETCHING; FREE ENERGY; ION IMPLANTATION; MORPHOLOGY; NUCLEATION; OXIDATION; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY; SILICON; SURFACE PHENOMENA; X RAY DIFFRACTION ANALYSIS;

HOT-FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); LONSDALEITE; SURFACE RECONSTRUCTION;

DIAMONDS;

EID: 0442295436     PISSN: 02561115     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02706954     Document Type: Article

References (12)

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