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Thin Solid Films

Volumn 335, Issue 1-2, 1998, Pages 249-252

Effects of high-temperature annealing on the structure of reactive sputtering a-SiC:H films

(3) Wang, Yinyue a Wang, Huiyao a Ma, Guobin a

a LANZHOU UNIVERSITY (China)

Author keywords

Amorphous materials; Annealing; Crystallization

Indexed keywords

ANNEALING; CHEMICAL BONDS; CRYSTALLIZATION; FILM PREPARATION; HYDROGENATION; MOLECULAR STRUCTURE; RAMAN SCATTERING; SILICON CARBIDE; SPUTTERING; THERMAL EFFECTS; X RAY CRYSTALLOGRAPHY;

REACTIVE SPUTTERING;

AMORPHOUS FILMS;

EID: 0348198655 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)00566-5 Document Type: Article

Times cited : (12)

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