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Volumn 288, Issue 1-2, 1996, Pages 83-85
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Measurement of the striking force of Ar ions on the substrate during sputter deposition of a-Si:H thin films
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Author keywords
a Si:H; Sputtering
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Indexed keywords
AMORPHOUS SILICON;
ARGON;
DENSIFICATION;
FILM GROWTH;
HYDROGENATION;
ION BOMBARDMENT;
MICROSTRUCTURE;
PIEZOELECTRIC MATERIALS;
PRESSURE EFFECTS;
SPUTTER DEPOSITION;
SUBSTRATES;
THIN FILMS;
FILM NETWORK;
PLASMA SUBSTRATE INTERACTIONS;
PSEUDOSUBSTRATE;
STRIKING FORCES;
AMORPHOUS FILMS;
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EID: 0030289189
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(96)08822-0 Document Type: Article |
Times cited : (11)
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References (15)
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