메뉴 건너뛰기




Volumn 288, Issue 1-2, 1996, Pages 83-85

Measurement of the striking force of Ar ions on the substrate during sputter deposition of a-Si:H thin films

Author keywords

a Si:H; Sputtering

Indexed keywords

AMORPHOUS SILICON; ARGON; DENSIFICATION; FILM GROWTH; HYDROGENATION; ION BOMBARDMENT; MICROSTRUCTURE; PIEZOELECTRIC MATERIALS; PRESSURE EFFECTS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS;

EID: 0030289189     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08822-0     Document Type: Article
Times cited : (11)

References (15)
  • 10
    • 0042826134 scopus 로고
    • PhD Thesis, Paris VII
    • J. Perrin, PhD Thesis, Paris VII, 1983.
    • (1983)
    • Perrin, J.1
  • 15
    • 0041323521 scopus 로고
    • PhD Thesis, Lyons
    • D.J. Tardy, PhD Thesis, Lyons, 1982.
    • (1982)
    • Tardy, D.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.