Paramagnetic-to-antiferromagnetic phase transformation in sputter-deposited Ni-Mn thin films

Journal of Electronic Materials

Volumn 32, Issue 11, 2003, Pages 1155-1159

  Ladwig, Peter F ^a   Yang, Ying ^a   Ding, Ling ^a   Tsu, I Fei ^b   Chang, Y Austin ^a  

^a University of Wisconsin Madison   (United States)

^b SEAGATE TECHNOLOGY   (United States)

Author keywords

Antiferromagnetic materials; Calorimetry; Grain growth; Magnetoresistance; Manganese alloys; Metastability; Nickel alloys; Phase transformation; Spin valves; Sputter deposition; Thin films

Indexed keywords

ACTIVATION ENERGY; ANTIFERROMAGNETIC MATERIALS; CRYSTAL STRUCTURE; DIFFERENTIAL SCANNING CALORIMETRY; ENTHALPY; GRAIN GROWTH; NUMERICAL METHODS; PARAMAGNETIC MATERIALS; PHASE TRANSITIONS; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EXOTHERMIC SIGNAL; KISSINGER METHOD; METASTABILITY; SPIN VALVES;

THIN FILMS;

EID: 0348107257     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-003-0005-6     Document Type: Article

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