Iron disilicide formed in a-Si〈Fe〉 thin films by magnetron co-sputtering

Physica B: Condensed Matter

Volumn 340-342, Issue , 2003, Pages 939-943

  Kudoyarova, V Kh ^a   Terukov, E I ^a   Kon'kov, O I ^a   Gusev, O B ^a   Davydov, V Yu ^a   Mosina, G N ^a  

^a IOFFE INSTITUTE   (Russian Federation)

Author keywords

Iron dicilicide; Magnetron; Photoluminescence; Thin films

Indexed keywords

ENERGY GAP; ION IMPLANTATION; LIGHT ABSORPTION; MAGNETRON SPUTTERING; MICROSTRUCTURE; OPTOELECTRONIC DEVICES; PHONONS; PHOTOLUMINESCENCE; SILICON; THIN FILMS;

OPTICAL GAPS; THIN-FILM STRUCTURES;

IRON COMPOUNDS;

EID: 0347946855     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2003.09.200     Document Type: Conference Paper

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