Carbon Films for Use as the Electron Source in a Parallel e-Beam Lithography System

New Diamond and Frontier Carbon Technology

Volumn 11, Issue 4, 2001, Pages 235-247

  Milne, W I ^a   Teo, K B K ^a   Chhowalla, M ^a   Amaratunga, G A J ^a   Yuan, J ^a   Robertson, J ^a   Legagneux, P ^b   Pirio, G ^b   Pribat, D ^b   Bouzehouane, K ^c   Bruenger, W ^d   Trautmann, C ^e  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b THALES RESEARCH AND TECHNOLOGY   (France)

^c CNRS   (France)

^d FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^e GSI HELMHOLTZZENTRUM FÜR SCHWERIONENFORSCHUNG GMBH   (Germany)

Author keywords

Carbon nanotubes; Diamond like carbon; Field emission

Indexed keywords

EID: 0347866941     PISSN: 13449931     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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