TiN growth on Si(100) by pulsed laser deposition using homogenized KrF excimer laser beam

Applied Surface Science

Volumn 138-139, Issue 1-4, 1999, Pages 335-339

  Obata, K ^b   Sugioka, K ^a   Takai, H ^b   Midorikawa, K ^a  

^a INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^b TOKYO DENKI UNIVERSITY   (Japan)

Author keywords

Homogenizer; Particle; PLD; Thin film; TiN

Indexed keywords

EID: 0347812905     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00414-0     Document Type: Article

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