Reflection surface x-ray diffraction patterns: k-space images

Review of Scientific Instruments

Volumn 71, Issue 8, 2000, Pages 3132-3137

  Hong, Hawoong ^a   Wu, Z ^a,b   Chiang, T C ^b   Zschack, P ^a   Jemian, P ^a   Chen, Haydn ^a,b   Aburano, R D ^c  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b University of Illinois at Urbana Champaign   (United States)

^c CYPRESS SEMICONDUCTOR   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347746532     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1305512     Document Type: Review

References (15)

1. For Si atoms, at a diffraction angle θ=5°, electron's scattering cross section is stronger by the factor of 160 000. The ratio increases as we decrease diffraction angles. See Hawoong Hong, Ph.D. thesis, MIT (1988) and H. A. Bethe and R. Jackiw, Intermediate Quantum Mechanics (Benjamin/Cummings, Reading, 1968), p. 244.
2. For Si atoms, at a diffraction angle θ=5°, electron's scattering cross section is stronger by the factor of 160 000. The ratio increases as we decrease diffraction angles. See Hawoong Hong, Ph.D. thesis, MIT (1988) and H. A. Bethe and R. Jackiw, Intermediate Quantum Mechanics (Benjamin/Cummings, Reading, 1968), p. 244.
3. I. Naday, E. M. Westbrook, M. L. Westbrook, D. J. Travis, M. Stanton, W. C. Philips, D. O'Mara, and J. Xie, Nucl. Instrum. Methods Phys. Res. A 348, 635 (1994).
4. For example, M. Yoon, S. G. J. Mochrise, M. W. Tate, S. M. Gruner, and E. F. Eikenberry, Phys. Rev. Lett. 80, 337 (1998).
5. For example, I. K. Robinson, P. J. Eng, P. A. Bennet, and B. De Vries, Appl. Surf. Sci. 60/61, 498 (1992); J. Als-Nielsen, D. Jacquemain, K. Kjaer, F. Leveiller, M. Lahav, and L. Leiserowitz, Phys. Rep. 246, 251 (1994).
6. For example, I. K. Robinson, P. J. Eng, P. A. Bennet, and B. De Vries, Appl. Surf. Sci. 60/61, 498 (1992); J. Als-Nielsen, D. Jacquemain, K. Kjaer, F. Leveiller, M. Lahav, and L. Leiserowitz, Phys. Rep. 246, 251 (1994).
7. M. Lohmeier and E. Vlieg, J. Appl. Crystallogr. 26, 706 (1993).
8. Trimax-2 is the trademark of 3M.
9. Z. Wu et al., Phys. Rev. B 59, 3283 (1999).
10. R. D. Aburano, Ph.D. thesis, University of Illinois at Urbana-Champaign (1997); I. K. Robinson, W. K. Waskiewicz, R. T. Tung, and J. Bohr, Phys. Rev. Lett. 57, 2714 (1986).
11. R. D. Aburano, Ph.D. thesis, University of Illinois at Urbana-Champaign (1997); I. K. Robinson, W. K. Waskiewicz, R. T. Tung, and J. Bohr, Phys. Rev. Lett. 57, 2714 (1986).
12. For CTR intensity measurements with a sample fixed, see E. D. Specht and F. T. Walker, J. Appl. Crystallogr. 26, 166 (1993). For the polarization factor of a surface six-circle diffractometer, see Elias Vlieg, ibid. 30, 532 (1997).
13. For CTR intensity measurements with a sample fixed, see E. D. Specht and F. T. Walker, J. Appl. Crystallogr. 26, 166 (1993). For the polarization factor of a surface six-circle diffractometer, see Elias Vlieg, ibid. 30, 532 (1997).
14. I. K. Robinson, W. K. Waskiewicz, P. H. Fuoss, and L. J. Norton, Phys. Rev. B 37, 4325 (1988).
15. P. M. J. Maree, K. Nakafawa, F. M. Mulders, J. F. Van der Veen, and K. L. Kavanagh, Surf. Sci. 191, 305 (1987).