Changes of hydrogen evolution thermodynamics induced by He and H2 dilution in PECVD a-Si:H films: Influence on thermal crystallization

Journal of Non-Crystalline Solids

Volumn 266-269 A, Issue , 2000, Pages 635-639

  Delli Veneri, P ^a   Privato, C ^a   Terzini, E ^a  

^a ENEA CR Portici   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347740493     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0022-3093(99)00757-7     Document Type: Article

References (12)

1. G. Fortunato, Thin Solid Films 296 (1997) 82.
2. T. Baba, M. Shima, T. Matsuyama, S. Tsuge, K. Wakisaka, S. Tsuda, in: Proceedings of the 13th EC PVSEC, 1995, p. 1708.
3. A. Shah, J. Meier, P. Torres, U. Kroll, D. Fischer, N. Beck, N. Wyrsch, H. Keppner, in: Proceedings of the 26th IEEE Conference, 1997, p. 569.
4. M.K. Hatalis, D.W. Greve, IEEE Electron. Dev. Lett. 8 (1987) 361.
5. T. Mohammed-Brahim, M. Sarret, D. Briad, K. Kis-Sion, L. Haji, O. Bonnaud, Philos. Mag. B 76 (1997) 193.
6. M.L. Addonizio, P. delli Veneri, G. Fameli, S. Loreti, C. Minarini, C. Privato, G. Sinno, E. Terzini, M. Vancini, Solid State Phenom. 67&68 (1999) 199.
7. L. Battezzati, F. Demichelis, C.F. Pirri, A. Tagliaferro, E. Tresso, J. Non-Cryst. Solids 137&138 (1991) 87.
8. N. Sridhar, D.D.L. Chung, W.A. Anderson, J. Coleman, J. Electron. Mater. 24 (10) (1995) 1451.
9. W. Beyer, H. Wagner, J. Appl. Phys. 53 (1982) 8745.
10. R.B. Iverson, R. Reif, J. Appl. Phys. 62 (1987) 5.
11. A.A. Langford, M.L. Fleet, B.P. Nelson, N. Maley, Phys. Rev. B 45 (1992) 13367.
12. A. Madan, M.P. Shaw, The Physics and Application of Amorphous Semiconductor, Academic Press, New York, 1990.