A new sputtering device of radio-frequency magnetron discharge using a rectangular hollow-shaped electrode

Review of Scientific Instruments

Volumn 69, Issue 4, 1998, Pages 1833-1836

  Ohtsu, Yasunori ^a   Tsurume, Yoshinobu ^a   Fujita, Hiroharu ^a  

^a SAGA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347541759     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1148850     Document Type: Article

References (19)

1. H. F. Winters and J. W. Coburn, Surf. Sci. Rep. 14, 161 (1992).
2. J. A. Thornon, J. Vac. Sci. Technol. A 4, 3059 (1986).
3. M. Konuma, Film Deposition by Plasma Techniques (Springer, New York, 1992).
4. S. Berg, H. O. Blom, M. Moradi, C. Nender, and T. Larsson, J. Vac. Sci. Technol. A 7, 1225 (1989).
5. K. E. Davies, M. Gross, and C. M. Horwitz, J. Vac. Sci. Technol. A 11, 2752 (1993).
6. L. H-Chul, K. G-Hong, H. S-Ku, L. K-Young, Y. Y-Joong, C. C-Hwau, and L. J-Young, Thin Solid Films 261, 148 (1995).
7. J. A. Thornton and A. S. Penfold, in Thin Film Processes, edited by J. L. Vossen and W. Kern (Academic, New York, 1978).
8. R. K. Waits, in Thin Film Processes, edited by J. L. Vossen and W. Kern (Academic, New York, 1978).
9. A. E. Wendt and M. A. Lieberman, J. Vac. Sci. Technol. A 8, 902 (1990).
10. T. E. Sheindan, M. J. Goeckner, and J. Goree, J. Vac. Sci. Technol. A 9, 688 (1990).
11. X. Quyang, A. H. Kitai, and T. Xiao, J. Appl. Phys. 79, 3229 (1996).
12. J. Uramoto, Research Report of IPP, Nagoya University IPPJ-628 (1983).
13. R. Azuma, K. Nanri, S. Harakawa, H. Watanabe, T. Noguchi, K. Yamauchi, K. Sunako, T. Takikawa, and K. Takayama, in Proceedings of the 7th Symposium on Plasma Processing, edited by I. Kato and R. Itatani, 317 (The Japan Society of Applied Physics, 1990).
14. Y. Okuno, H. Ishikura, and H. Fujita, Rev. Sci. Instrum. 63, 44 (1992).
15. Y. Okuno, H. Ishikura, and H. Fujita, Rev. Sci. Instrum. 63, 3725 (1992).
16. K. Murata, Y. Okuno, and H. Fujita, Rev. Sci. Instrum. 65, 673 (1994).
17. J. Q. Zhang, Y. Setsuhara, T. Ariyasu, and S. Miyake, J. Vac. Sci. Technol. A 4, 2163 (1996).
18. Y. Ohtsu, G. Tochitani, H. Fujita, J. Q. Zhang, Y. Setsuhara, and S. Miyake, Jpn. J. Appl. Phys., Part 1 36, 4620 (1997).
19. F. F. Chen, in Plasma Diagnostic Techniques, edited by R. H. Huddlestone and S. L. Leonard (Academic, New York, 1965).