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Volumn , Issue , 1998, Pages 296-300
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High temperature stable WSix ohmic contacts on GaN
a a a a b c d d e |
Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINUM COMPOUNDS;
ANNEALING;
ELECTRIC CONTACTORS;
GALLIUM NITRIDE;
HETEROJUNCTIONS;
III-V SEMICONDUCTORS;
ION IMPLANTATION;
METALLIZING;
OHMIC CONTACTS;
SILICON WAFERS;
ANNEALED MATERIALS;
ANNEALING TREATMENTS;
CONTACT MORPHOLOGY;
CRYSTALLINE DEFECTS;
GRADED COMPOSITION;
HIGH DEFECT DENSITIES;
NON-UNIFORM DOPING;
TEMPERATURE STABLE;
INDIUM ALLOYS;
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EID: 0347515545
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/HITEC.1998.676807 Document Type: Conference Paper |
Times cited : (2)
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References (9)
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