Diffusion of Bi, Er and Eu implanted into S1813 photoresist

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 215, Issue 1-2, 2004, Pages 90-98

  Soares, M R F ^a,b   Amaral, L ^a   Behar, M ^a   Fink, F ^b  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

Diffusion; Implantation; Metals; Polymers; Radiation enhanced diffusion; Trapping detrapping

Indexed keywords

ACTIVATION ENERGY; ANNEALING; BISMUTH; DATABASE SYSTEMS; ERBIUM; EVAPORATION; HEAT TREATMENT; ION IMPLANTATION; IRRADIATION; PHOTORESISTORS; POLYMERS; RADIATION DAMAGE; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

DETRAPPING; ENERGY RESOLUTION; RADIATION ENHANCED DIFFUSION; TRAPPING;

DIFFUSION;

EID: 0347024165     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)01787-7     Document Type: Article

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