![]() |
Volumn 132, Issue 4, 1997, Pages 660-670
|
Changes in the photoresist inhibitor distribution after ion irradiation and thermal treatment
|
Author keywords
Diffusion; Ion irradiation; Photoresist; Polymers; Thermal annealing
|
Indexed keywords
ANNEALING;
DIFFUSION;
ION BEAMS;
ION BOMBARDMENT;
RADIATION DAMAGE;
RADIATION EFFECTS;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
POSITIVE PHOTORESISTS;
PHOTORESISTS;
|
EID: 0031357747
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(97)00501-6 Document Type: Article |
Times cited : (9)
|
References (13)
|