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Volumn 132, Issue 4, 1997, Pages 660-670

Changes in the photoresist inhibitor distribution after ion irradiation and thermal treatment

Author keywords

Diffusion; Ion irradiation; Photoresist; Polymers; Thermal annealing

Indexed keywords

ANNEALING; DIFFUSION; ION BEAMS; ION BOMBARDMENT; RADIATION DAMAGE; RADIATION EFFECTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

EID: 0031357747     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00501-6     Document Type: Article
Times cited : (9)

References (13)
  • 1
    • 85033109659 scopus 로고    scopus 로고
    • Shipley Europe Ltd., Swiss Office, Fluhstr. 30, CH-8640 Rapperswil, Switzerland
    • Shipley Europe Ltd., Swiss Office, Fluhstr. 30, CH-8640 Rapperswil, Switzerland.
  • 9
    • 85033103593 scopus 로고    scopus 로고
    • Ph. D. Thesis, Humboldt University, Berlin
    • R. Klett, Ph. D. Thesis, Humboldt University, Berlin 1997.
    • (1997)
    • Klett, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.