Ultra-trace element analysis on Si wafer surface by total reflection X-ray photoelectron spectroscopy

Bunseki Kagaku

Volumn 47, Issue 11, 1998, Pages 873-879

  Iijima, Yoshitoki ^a   Miyoshi, Kousuke ^b   Saito, Syuichi ^b  

^a JEOL LTD   (Japan)

^b NEC CORPORATION   (Japan)

Author keywords

Cu; Detection limit; Fe; Sampling depth; Si wafer; Total reflection photoelectron spectroscopy; TXRF; XPS

Indexed keywords

EID: 0346705954     PISSN: 05251931     EISSN: None     Source Type: Journal    
DOI: 10.2116/bunsekikagaku.47.873     Document Type: Article

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