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Volumn 14, Issue 6, 1996, Pages 4115-4118

Reliable fabrication of sub-40 nm period gratings using a nanolithography system with interferometric dynamic focus control

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0346388941     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588602     Document Type: Article
Times cited : (4)

References (13)
  • 4
    • 5344272933 scopus 로고
    • Ph.D. thesis, University of Glasgow
    • S. A. Rishton, Ph.D. thesis, University of Glasgow (1983).
    • (1983)
    • Rishton, S.A.1
  • 9
    • 5344226011 scopus 로고    scopus 로고
    • This method is used on the Leica EBPG 5 electron beam lithography system
    • This method is used on the Leica EBPG 5 electron beam lithography system.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.