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Volumn 83, Issue 3, 2002, Pages 279-290

Understanding plasma sources

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0346364577     PISSN: 00113891     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (39)

References (27)
  • 1
    • 0003666038 scopus 로고
    • (eds Rossnagel Stephen, Cuomo Jerome, J. and Westwood William, W.), Noyes Publications, Park Ridge, NJ
    • Cecchi Joseph, C., in Handbook of Plasma Processing Technology (eds Rossnagel Stephen, Cuomo Jerome, J. and Westwood William, W.), Noyes Publications, Park Ridge, NJ, 1990.
    • (1990) Handbook of Plasma Processing Technology
    • Cecchi Joseph, C.1
  • 8
    • 24844454162 scopus 로고
    • Special issue on magnetically confined fusion
    • Phys. Today, 1979, 32, Special issue on magnetically confined fusion.
    • (1979) Phys. Today , vol.32


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.