The Effect of Macromolecular Architecture on the Thin Film Aqueous Base Dissolution of Phenolic Polymers for Microlithography

ACS Symposium Series

Volumn 695, Issue , 1998, Pages 360-370

  Barclay, G G ^a   King, M ^a   Orellana, A ^a   Malenfant, P R L ^a   Sinta, R ^a   Malmstrom, E ^b   Ito, H ^b   Hawker, C J ^b  

^a SHIPLEY COMPANY   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346339890     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Article

References (11)

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3. P.C. Tsiartas; L.L. Simpson; A. Qin; C.G. Willson; R.D. Allen; V.J. Krukonis; P.M Gallagher-Wetmore, ibid, 261.
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8. M.K Georges; R.P.N. Veregin; P.M. Kazmaier; G.K. Hamer, Macromolecules, 1993, 26, 2987. C.J Hawker, J. Am. Chem. Soc., 1994, 116, 11314, K. Matyjaszewski; S. Gaynor; J.S. Wang, Macromolecules, 1995, 28, 2093.
9. M.K Georges; R.P.N. Veregin; P.M. Kazmaier; G.K. Hamer, Macromolecules, 1993, 26, 2987. C.J Hawker, J. Am. Chem. Soc., 1994, 116, 11314, K. Matyjaszewski; S. Gaynor; J.S. Wang, Macromolecules, 1995, 28, 2093.
10. C.J. Hawker, G.G. Barclay, A. Orellana, J. Dao and W. Devonport, Macromolecules, 1996, 29(16), 5245.
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