Characterization of SiO2 Surface Treated by HMDS Vapor and O2 Plasma with AFM Tip

Journal of Photopolymer Science and Technology

Volumn 16, Issue 5, 2003, Pages 665-668

  Kawai, Akira ^a   Kawakami, Junko ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Adhesion; AFM; HMDS; Micro machine; Surface energy

Indexed keywords

HEXAMETHYLDISILAZANE; SILANE DERIVATIVE; SILICON DIOXIDE; UNCLASSIFIED DRUG;

ADHESION; ATOMIC FORCE MICROSCOPY; CONFERENCE PAPER; CORRELATION ANALYSIS; DISPERSION; ELASTICITY; ENERGY; FILM; FORCE; HYDROPHILICITY; HYDROPHOBICITY; POLARIZATION; SURFACE PROPERTY; VAPOR;

EID: 0346158274     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.665     Document Type: Conference Paper

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