The characterization of nanocrystal graphite films deposited by ECR plasma sputtering

Diamond and Related Materials

Volumn 12, Issue 10-11, 2003, Pages 2011-2015

  Ohana, T ^a   Nakamura, T ^a   Goto, A ^a   Tsugawa, K ^a   Tanaka, A ^a   Koga, Y ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Nanocrystal graphitic films; Plasma sputtering; Tribology

Indexed keywords

BINDING ENERGY; ELECTRIC CONDUCTIVITY; MAGNETIC FLUX; NANOSTRUCTURED MATERIALS; PLASMA DENSITY; SPUTTER DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

TRIBOLOGICAL PROPERTIES;

GRAPHITE;

DIAMOND;

EID: 0346119970     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(03)00263-2     Document Type: Article

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