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Volumn 266-269 A, Issue , 2000, Pages 565-568

On the relation between defect density and dopant concentration in amorphous silicon films

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Indexed keywords


EID: 0345848976     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0022-3093(99)00846-7     Document Type: Article
Times cited : (7)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.