Effect of rapid thermal annealing and hydrogen plasma treatment on the microstructure and light-emission of silicon-rich oxide film

Wuli Xuebao/Acta Physica Sinica

Volumn 51, Issue 7, 2002, Pages 1569-1570

  Wang, Yong Qian ^a   Chen, Wei De ^a   Chen, Chang Yong ^a   Diao, Hong Wei ^a   Zhang, Shi Bin ^a   Xu, Yan Yue ^a   Kong, Guang Lin ^a   Liao, Xian Bo ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

Light emission; Microstructure; Rapid thermal annealing; Silicon rich silicon oxide

Indexed keywords

EID: 0345795226     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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