Structural analysis of NiO ultra-thin films epitaxially grown on ultra-smooth sapphire substrates by synchrotron X-ray diffraction measurements

Applied Surface Science

Volumn 221, Issue 1-4, 2004, Pages 450-454

  Sakata, O ^a   Yi, Min Su ^a,c   Matsuda, A ^b   Liu, J ^b   Sato, S ^b   Akiba, S ^b   Sasaki, A ^b   Yoshimoto, M ^b  

^a JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c Kyungpook National University   (South Korea)

Author keywords

Crystalline domain size; NiO ultra thin film; Synchrotron X ray diffraction; Ultra smooth sapphire

Indexed keywords

ANNEALING; CRYSTAL MICROSTRUCTURE; EPITAXIAL GROWTH; FILM GROWTH; LATTICE VIBRATIONS; MAGNETORESISTANCE; NANOSTRUCTURED MATERIALS; NICKEL COMPOUNDS; PULSED LASER DEPOSITION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SAPPHIRE; STRUCTURAL ANALYSIS; SUBSTRATES; THERMODYNAMICS; X RAY CRYSTALLOGRAPHY; X RAY DIFFRACTION ANALYSIS;

CRYSTALLOGRAPHIC STRUCTURE; VACUUM CHAMBERS;

ULTRATHIN FILMS;

EID: 0345603117     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00961-9     Document Type: Article

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