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Volumn 39, Issue 24, 2003, Pages 1702-1703

Micromachined 2D nanoelectrospray emitter

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; MASS SPECTROMETRY; MICROMACHINING; PHOTORESISTS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MODELS;

EID: 0345566243     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20031099     Document Type: Article
Times cited : (5)

References (5)
  • 1
    • 0004276416 scopus 로고    scopus 로고
    • Microfluidic technology and applications
    • In Pethig, R (Ed.); (Research Studies Press, UK); Chap. 6
    • Koch, M., Evans, A., and Brunnschweiler, A.: In PETHIG, R (Ed.): 'Microfluidic technology and applications' (Research Studies Press, UK, 2000), Chap. 6, pp. 151-287
    • (2000) , pp. 151-287
    • Koch, M.1    Evans, A.2    Brunnschweiler, A.3
  • 2
    • 0035144377 scopus 로고    scopus 로고
    • Proteomics on a chip: Promising developments
    • Figeys, D., and Pinto, D.: 'Proteomics on a chip: promising developments', Electrophoresis, 2001, 22, pp. 208-216
    • (2001) Electrophoresis , vol.22 , pp. 208-216
    • Figeys, D.1    Pinto, D.2
  • 3
    • 0036735414 scopus 로고    scopus 로고
    • Development of micromachined hollow tips for protein analysis based on nanoelectrospray ionisation mass spectrometry
    • Griss, P., Melin, J., Sjodahl, J., Roeraade, J., and Stemme, G.: 'Development of micromachined hollow tips for protein analysis based on nanoelectrospray ionisation mass spectrometry', J. Micromech. Microeng., 2002, 12, pp. 682-687
    • (2002) J. Micromech. Microeng. , vol.12 , pp. 682-687
    • Griss, P.1    Melin, J.2    Sjodahl, J.3    Roeraade, J.4    Stemme, G.5
  • 4
    • 0033100851 scopus 로고    scopus 로고
    • Silicon processed micro-needles
    • Lin, L., and Pisano, P.: 'Silicon processed micro-needles', IEEE J. Micromech. Sys., 1999, 8, pp. 78-84
    • (1999) IEEE J. Micromech. Sys. , vol.8 , pp. 78-84
    • Lin, L.1    Pisano, P.2
  • 5
    • 0036734816 scopus 로고    scopus 로고
    • A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photo resist
    • Lin, C.-H., Lee, G.-B., Chang, B.-W., and Chang, G.-L.: 'A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photo resist', J. Micromech. Microeng., 2002, 12, pp. 590-597
    • (2002) J. Micromech. Microeng. , vol.12 , pp. 590-597
    • Lin, C.-H.1    Lee, G.-B.2    Chang, B.-W.3    Chang, G.-L.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.