Electrostatically actuated micromirror devices in silicon technology

Sensors and Actuators, A: Physical

Volumn 74, Issue 1, 1999, Pages 216-218

  Lang, W ^a   Pavlicek H ^a   Marx, Th ^a   Scheithauer, H ^a   Schmidt, B ^a  

^a Hahn Schickard Gesellschaft (HSG)   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; DRY ETCHING; MICROMACHINING; REACTIVE ION ETCHING; SILICON WAFERS; SINGLE CRYSTALS;

ANODIC BONDING; MICROMIRROR;

MIRRORS;

EID: 0345440109     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00321-5     Document Type: Article

References (4)

1. Valette S. Microoptics, a key technology in the race to microsystems. J. Micromech. Microeng. 5:1995;74.
2. J.B. Sampsell, The digital micromirror device and its applications to projection displays, Proc. of 7th Int. on Solid State Sensors and Actuators, Yokohama, 1993, p. 24.
3. M. Fischer, M. Nägerle, D. Eichner, C. Schöllhorn, R. Strobel, Integration of surface micromachined polysilicon mirrors in a standard CMOS process, Proc. of 8th Int. on Solid State Sensors and Actuators, Stockholm, 1995, pp. 305-307.
4. Gessner T., Dötzel W., Billep D., Hahn R., Kaufmann C. Silicon mirror arrays fabricated by using bulk- and surface micromachining. SPIE Proc. 3008:1997;34.