Surfactant effect on oxide-to-nitride removal selectivity of nano-abrasive ceria slurry for chemical mechanical polishing

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 9 A, 2003, Pages 5420-5425

  Park, Jea Gun ^a   Katoh, Takeo ^a   Lee, Won Mo ^a   Jeon, Hyeongtag ^a   Paik, Ungyu ^a  

^a Hanyang University   (South Korea)

Author keywords

Abrasive; Ceria; CMP; Nitride; Oxide; Preston's law; Selectivity; Slurry; Surfactant; Zeta potential

Indexed keywords

ABRASIVES; CHEMICAL MECHANICAL POLISHING; COMPOSITION EFFECTS; ELECTROSTATICS; MATERIALS TESTING; NANOSTRUCTURED MATERIALS; NITRIDES; OXIDES; PARTICLE SIZE ANALYSIS; REMOVAL; SLURRIES; SURFACE ACTIVE AGENTS;

CERIA SLURRY; DILUTE CONCENTRATIONS; PRESTONIAN BEHAVIOR; REMOVAL RATE; REMOVAL SELECTIVITY; SURFACTANT EFFECT;

CERIUM COMPOUNDS;

EID: 0345357006     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.5420     Document Type: Article

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