Limiting current in a relativistic diode under the condition of magnetic insulation

Physics of Plasmas

Volumn 10, Issue 11, 2003, Pages 4489-4493

  Lopez, Mike ^a   Lau, Y Y ^a   Luginsland, John W ^a,b   Jordan, David W ^a   Gilgenbach, Ronald M ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b SCIENCE APPLICATIONS INTERNATIONAL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; CURRENT DENSITY; ELECTRIC FIELD EFFECTS; ELECTRIC SPACE CHARGE; ELECTRON TRANSPORT PROPERTIES; INSULATION; MAGNETIC FIELD EFFECTS; MAGNETIC MATERIALS; RELATIVITY;

CYCLOIDAL FLOW; LIMITING CURRENT; MAGNETIC INSULATION; RELATIVISTIC DIODE;

PLASMA DIODES;

EID: 0344980613     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1613654     Document Type: Article

References (53)

1. A. Ron, A. A. Mondelli, and N. Rostoker, IEEE Trans. Plasma Sci. PS-1, 85 (1973).
2. R. V. Lovelace and E. Ott, Phys. Fluids 17, 1263 (1974).
3. P. J. Christenson, Ph.D. dissertation, University of Michigan, Ann Arbor (1996).
4. J. A. Swegle, IEEE Trans. Plasma Sci. PS-24, 1277 (1996)
5. J. A. Swegle, Phys. Fluids 25, 1282 (1982)
6. J. A. Swegle, Phys. Fluids 26, 1670 (1983).
7. J. A. Swegle and E. Ott, Phys. Fluids 24, 1821 (1981).
8. E. Ott and R. V. Lovelace, Appl. Phys. Lett. 27, 378 (1975).
9. M. P. Desjarlais and R. N. Sudan, Phys. Fluids 29, 1746 (1986)
10. M. P. Desjarlais and R. N. Sudan, Phys. Fluids 29, 1245 (1986)
11. M. P. Desjarlais and R. N. Sudan, Phys. Fluids 30, 1536 (1987).
12. K. D. Bergeron, Appl. Phys. Lett. 28, 306 (1976).
13. C. W. Mendel, J. Appl. Phys. 50, 3830 (1979).
14. P. A. Miller and C. W. Mendel, Jr., J. Appl. Phys. 61, 529 (1987).
15. C. W. Mendel, D. B. Seidel, and S. A. Slutz, Phys. Fluids 26, 3628 (1983)
16. C. W. Mendel, S. E. Rosenthal, and D. B. Seidel, Phys. Rev. A 45, 5854 (1992).
17. N. A. Krall and S. E. Rosenthal, J. Appl. Phys. 70, 2542 (1991).
18. J. M. Creedon, J. Appl. Phys. 48, 1070 (1977).
19. T. R. Lockner and J. W. Poukey, J. Appl. Phys. 57, 2652 (1985).
20. P. A. Lindsay and R. S. Goodell, J. Appl. Phys. 36, 411 (1965).
21. T. J. Orzechowski and G. Bekefi, Phys. Fluids 19, 43 (1976)
22. T. J. Orzechowski and G. Bekefi, Phys. Fluids 22, 978 (1979).
23. J. P. Verboncoeur and C. K. Birdsall, Phys. Plasmas 3, 712 (1996).
24. V. P. Gopinath, J. P. Verboncoeur, and C. K. Birdsall, Phys. Plasmas 3, 2766 (1996)
25. V. P. Gopinath and B. H. Vandenberg, ibid. 5, 261 (1998).
26. B. W. Church and R. N. Sudan, Phys. Plasmas 3, 3809 (1996).
27. C. K. Birdsall and W. B. Bridges, Electron Dynamics of Diode Regions (Academic, New York, 1966).
28. R. B. Miller, An Introduction to the Physics of Intense Charged Particle Beams (Plenum, New York, 1982), Sec. 3.3.4.
29. R. C. Davidson, Physics of Nonneutral Plasmas (Addison-Wesley, Redwood City, CA, 1990).
30. J. P. Verboncoeur, M. V. Alves, V. Vahedi, and C. K. Birdsall, J. Comput. Phys. 104, 321 (1993).
31. H. R. Jory and A. W. Trivelpiece, J. Appl. Phys. 40, 3924 (1969).
32. B. Goplan, L. Ludeking, D. Smithe, and G. Warren, Comput. Phys. Commun. 87, 54 (1995).
33. P. J. Christenson and Y. Y. Lau, Phys. Rev. Lett. 76, 3324 (1996).
34. P. J. Christenson, D. P. Chernin, A. L. Garner, and Y. Y. Lau, Phys. Plasmas 3, 4455 (1996).
35. A. L. Garner, Y. Y. Lau, and D. Chernin, Phys. Plasmas 5, 2447 (1998).
36. J. C. Slater, Microwave Electronics (Van Nostrand, New York, 1950), Chap. 13.
37. O. Buneman, in Crossed-Field Microwave Devices, edited by E. Okress (Academic, New York, 1961), Vol. 1, p. 209.
38. H. L. McDowell, IEEE Trans. Plasma Sci. 30, 980 (2002).
39. T. M. Antonsen, Jr. and E. Ott, Phys. Fluids 19, 52 (1976).
40. T. M. Antonsen, Jr., E. Ott, C. L. Chang, and A. T. Drobot, Phys. Fluids 28, 2878 (1985).
41. A. Valfells, D. W. Feldman, M. Virgo, P. G. O'Shea, and Y. Y. Lau, Phys. Plasmas 9, 2377 (2002).
42. M. C. Clark, B. M. Marder, and L. D. Bacon, Appl. Phys. Lett. 52, 78 (1988).
43. R. W. Lemke and M. C. Clark, J. Appl. Phys. 62, 3436 (1987).
44. M. D. Haworth, G. Baca, J. Benford et al., IEEE Trans. Plasma Sci. 26, 312 (1998)
45. K. J. Hendricks, J. Benford, J. Eastwood, M. Friedman, M. Haworth, R. W. Lemke, J. W. Luginsland, R. B. Miller, and J. Pasour, in High-Power Microwave Sources and Technologies, edited by R. J. Barker and E. Schamiloglu (IEEE, Piscataway, NJ, 2001), Chap. 3.
46. D. Shiffler, G. Baca, T. Englert et al., IEEE Trans. Plasma Sci. 26, 304 (1998).
47. F. J. Agee, W. L. Baker, and J. A. Gaudet, in High-Power Microwave Sources and Technologies, edited by R. J. Barker and E. Schamiloglu (IEEE, Piscataway, NJ, 2001), Chap. 2.
48. Y. Y. Lau, P. J. Christenson, and D. P. Chernin, Phys. Fluids B 5, 4486 (1993).
49. J. W. Luginsland, Y. Y. Lau, R. J. Umstattd, and J. J. Watrous, Phys. Plasmas 9, 2371 (2002)
50. R. J. Umstattd and J. W. Luginsland, Phys. Rev. Lett. 87, 145002 (2001).
51. J. W. Luginsland, Y. Y. Lau, and R. M. Gilgenbach, Phys. Rev. Lett. 77, 4668 (1996)
52. Y. Y. Lau, ibid. 87, 278301 (2001).
53. F. Hegeler, M. Friedman, M. C. Myers, J. D. Sethian, and S. B. Swanekamp, Phys. Plasmas 9, 4309 (2002).