Combined thermal and optical analysis of laser back-scribing for amorphous-silicon photovoltaic cells processing

International Journal of Heat and Mass Transfer

Volumn 42, Issue 4, 1999, Pages 645-656

  Avagliano, Salvatore ^a   Bianco, Nicola ^b   Manca, Oronzio ^c   Naso, Vincenzo ^b  

^a ENEA CR Portici   (Italy)

^b Dipartlmento dl Energetica Termofluldodlnamlca Appllcata e Condlzlonamentl Ambientall   (Italy)

^c SECOND UNIVERSITY OF NAPLES   (Italy)

Author keywords

Amorphous silicon; Laser back scribing; Multilayer thin film; Photovoltaic module fabrication; Thermal and optical analysis

Indexed keywords

FABRICATION;

EID: 0344958869     PISSN: 00179310     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0017-9310(98)00200-2     Document Type: Article

References (24)

1. C.P. Grigoropoulos, Heat transfer in laser processing of thin films, in: C.L. Tien (Ed.), Annual Review of Heat Transfer, CRC Press, Boca Raton, FL, 1994.
2. M. Mansuripur, G.A.N. Connell, J.W. Goodman, Laser-induced local heating of multilayers, Applied Optics 21 (1982) 1106-1114.
3. I.D. Calder, R. Sue, Modeling of CW laser annealing of multilayer structures, Journal of Applied Physics 53 (1982) 7545-7550.
4. E. Abraham, J.M. Halley, Some calculations of temperature profiles in thin films with laser heating, Applied Physics A 42 (1987) 279-285.
5. R. Kant, Laser-induced heating of multilayered medium resting on a half-space: Part I - stationary source, ASME Journal of Applied Mechanics 55 (1988) 93-97.
6. H. Koyanagi, T. Ito, N. Miyamoto, Y. Sato, H. Ando, Optical and thermal analysis on multilayered thin films of a phase-change optical recording disk, Journal of Applied Physics 66 (1989) 1045-1050.
7. M.R. Madison, McDaniel, Temperature distributions produced in an N-layer film structure by static or scanning laser or electron beam with application to magneto-optical media, Journal of Applied Physics 66 (1989) 5738-5748.
8. K. Shimizu, S. Imai, O. Sugiura, M. Matsumura, Transient temperature profiles in silicon films during pulsed laser annealing, Japanese Journal of Applied Physics 30 (1991) 2664-2672.
9. W.A. McGahan, K.D. Cole, Solutions of heat conduction equation in multilayers for photothermal deflection experiments, Journal of Applied Physics 72 (1992) 1362-1373.
10. H.K. Park, X. Xu, C.P. Grigoropoulos, N. Do, L. Klees, P.T. Leung, A.C. Tarn, Temporal profile of optical transmission probe for pulsed-laser heating of amorphous films, Applied Physics Letter 61 (1992) 749-751.
11. H.K. Park, X. Xu, C.P. Grigoropoulos, N. Do, L. Klees, P.T. Leung, A.C. Tam, Transient optical transmission measurement in excimer-laser irradiation of amorphous silicon films, ASME Journal of Heat Transfer 115 (1993) 178-183.
12. C.P. Grigoropoulos, H.K. Park, X. Xu, Modeling of pulsed laser irradiation of thin silicon layers, International Journal of Heat and Mass Transfer 36 (1993) 919-924.
13. H. Machlab, W.A. McGahan, J.A. Woollam, K.D. Cole, Thermal characterization of thin films by photothermally induced laser beam deflection, Thin Solid Films 224 (1993) 22-27.
14. K.D. Cole, W.A. McGahan, Theory of multilayers heated by laser absorption, ASME Journal of Heat Transfer 115 (1993) 767-771.
15. G. Chen, C.L. Tien, Thermally induced optical nonlinearity during transient heating of thin films, ASME Journal of Heat Transfer 24 (1994) 311-316.
16. X. Xu, C.P. Grigoropoulos, R.E. Russo, Transient temperature during pulsed excimer laser heating of thin polysilicon films obtained by reflectivity measurement, ASME Journal of Heat Transfer 117 (1995) 17-24.
17. S. Nakano, T. Matsuoka, S. Kiyama, H. Kawata, N. Nakamura, Y. Nakashima, S. Tsuda, H. Nishiwaki, M. Ohnishi, I. Nagakoa, Y. Kuwano, Laser patterning method for integrated type a-Si solar cell submodules, Japanese Journal of Applied Physics 25 (1986) 1936-1943.
18. S. Kiyama, Y. Hirono, H. Hosokawa, T. Moriguchi, S. Nakano, M. Osumi, Temperature distribution analysis in multi-layer thin film structures by laser beam irradiation, Japanese Society of Precision and Engineering 56 (1990) 1500-1506.
19. Y. Kishi, K. Murata, H. Inou, S. Kiyama, M. Ohnishi, S. Nakano, Y. Kuwano, A laser welding and scribing (LWS) method for a high-yield integrated-type, Japanese Journal of Applied Physics 30 (1991) 1628-1634.
20. S. Avagliano, M.L. Addonizio, G. Conte, C. Private, Back scribing process in the fabrication of the integrated a-Si : H modules, Proceedings of the twelfth European Photovoltaic Solar Energy Conference and Exhibition, Amsterdam, 1994.
21. N. Angelucci, N. Bianco, O. Manca, Thermal transient analysis of thin film multilayers heated by pulsed laser, International Journal of Heat and Mass Transfer 40 (1997) 4487-4491.
22. M. Born, E. Wolf, Principles of Optics, 6th ed. Pergamon Press, Oxford, 1980.
23. C.K. Ong, H.S. Tan, E.H. Sin, Calculation of melting threshold energies of crystalline and amorphous materials due to pulsed-laser irradiation, Materials Science and Engineering 79 (1986) 79-85.
24. N. Do, L. Klees, P.T. Leung, F. long, W.P. Leung, A.C. Tarn, Temperature dependence of optical constants for amorphous silicon, Applied Physics Letters 60 (1992)2186-2188.