Thermal transient analysis of thin film multilayers heated by pulsed laser

International Journal of Heat and Mass Transfer

Volumn 40, Issue 18, 1997, Pages 4487-4491

  Angelucci, Nello ^a   Bianco, Nicola ^a   Manca, Oronzio ^b  

^a UNIVERSITY OF NAPLES FEDERICO II   (Italy)

^b SECOND UNIVERSITY OF NAPLES   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AMORPHOUS SILICON; GLASS; HEATING; MULTILAYERS; NONLINEAR OPTICS; NUMERICAL ANALYSIS; OXIDES; PHOTOVOLTAIC CELLS; PULSED LASER APPLICATIONS; SUBSTRATES; THIN FILMS;

ONE DIMENSIONAL; THERMAL TRANSIENTS;

TEMPERATURE DISTRIBUTION;

EID: 0031281722     PISSN: 00179310     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0017-9310(97)00059-8     Document Type: Article

References (10)

1. Grigoropoulos, C. P., Heat transfer in laser processing of thin films. In Annual Review of Heat Transfer, Chap. 2, ed. C. L. Tien. CRC Press, Boca Raton, FL, 1994.
2. Chen, G. and Tien, C. L., Thermally induced optical nonlinearity during transient heating of thin films. ASME Journal of Heat Transfer, 1994, 24, 311-316.
3. Mansuripur, M., Connell, G. A. N. and Goodman, J. W., Laser-induced local heating of multilayers. Applied Optics, 1982, 21, 1106-1114.
4. Nakano, S., Matsuoka, T., Kiyama, S., Kawata, H., Nakamura, N., Nakashima, Y., Tsuda, S., Nishiwaki, H., Ohnishi, M., Nagakoa, I. and Kuwano, Y., Laser patterning method for integrated type a-Si solar cell sub-modules. Japanese Journal of Applied Physics, 1986, 25, 1936-1943.
5. McGahan, W. A. and Cole, K. D., Solutions of heat conduction equation in multilayers for photothermal deflection experiments. Journal of Applied Physics, 1992. 72, 1362-1373.
6. Grigoropoulos, C. P., Park, H. K. and Xu, X., Modeling of pulsed laser irradiation of thin silicon layers. International Journal of Heat and Mass Transfer, 1993, 36, 919-924.
7. El-Adawi, M. K., Abdel-Naby, M. A. and Shalaby, S. A., Laser heating of a two-layer system with constant surface absorption : an exact solution. International Journal of Heat and Mass Transfer, 1995, 38, 947-952.
8. Kiyama, S., Hirono, Y., Hosokawa, H., Moriguchi, T., Nakano, S. and Osumi, M., Temperature distribution analysis in multi-layer thin film structures by laser beam irradiation, Japanese Society of Precision Engineering, 1990, 56, 1500-1506.
9. Do, N., Klees, L., Leung, P. T., Tong, F., Leung, W. P. and Tam, A. C., Temperature dependence of optical constants for amorphous silicon. Applied Physics Letters, 1992, 60, 2186-2188.
10. Ong, C. K., Tan, H. S. and Sin, E. H., Calculation of melting threshold energies of crystalline and amorphous materials due to pulsed-laser irradiation. Materials, Science and Engineering, 1986, 79, 79-85.