Microfocusing of 82 keV x rays with a sputtered-sliced Fresnel zone plate

Review of Scientific Instruments

Volumn 74, Issue 11, 2003, Pages 4948-4949

  Awaji, M ^a   Suzuki, Y ^a   Takeuchi, A ^a   Takano, H ^a   Kamijo, N ^a,b   Yasumoto, M ^a,c   Terada, Y ^a   Tamura, S ^a,c  

^a JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^b KANSAI MEDICAL UNIVERSITY   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON SOURCES; IMAGING SYSTEMS; LIGHT SOURCES; MONOCHROMATORS; SPUTTERING; X RAY DIFFRACTION ANALYSIS;

FRESNEL ZONE PLATES (FZP); MAGNIFICATION FACTORS;

X RAY OPTICS;

EID: 0344945661     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1606116     Document Type: Article

References (5)

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3. S. D. Shastri, J. M. Master, B. Lai, and J. Tys, Opt. Commun. 197, 9 (2001).
4. Y. Suzuki et al., Nucl. Instrum. Methods Phys. Res. A 467-468, 951 (2001).
5. D. Rudolph, B. Niemann, and G. Schmahl, Proc. Soc. Photo-Opt. Instrum. Eng. 316, 103 (1981).