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Volumn 48, Issue 3, 2004, Pages 367-371

Directional effects on bound quantum states for trench oxide quantum wires on (1 0 0)-silicon

Author keywords

Directional effects; MOSFET; Quantum wire; Silicon; Surface

Indexed keywords

ELECTRIC CONDUCTANCE; ELECTRON ENERGY LEVELS; MOSFET DEVICES; POISSON DISTRIBUTION; SEMICONDUCTING SILICON;

EID: 0344898415     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2003.08.006     Document Type: Article
Times cited : (4)

References (10)
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  • 2
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    • Trellakis, A.1    Ravaioli, U.2
  • 3
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    • Explicit local exchange-correlation potentials
    • Hedin L., Lundqvist B.I. Explicit local exchange-correlation potentials. J. Phys. C. 4:1971;2064-2083.
    • (1971) J. Phys. C , vol.4 , pp. 2064-2083
    • Hedin, L.1    Lundqvist, B.I.2
  • 4
    • 0001276540 scopus 로고
    • Density-functional calculation of sub-band structure in accumulation and inversion layers
    • Ando Y. Density-functional calculation of sub-band structure in accumulation and inversion layers. Phys. Rev. B. 13(8):1976;3468-3477.
    • (1976) Phys. Rev. B , vol.13 , Issue.8 , pp. 3468-3477
    • Ando, Y.1
  • 6
    • 36549090780 scopus 로고
    • Electron states in narrow gate-induced channels in Si
    • Laux S.E., Stern F. Electron states in narrow gate-induced channels in Si. Appl. Phys. Lett. 49(2):1986;91-93.
    • (1986) Appl. Phys. Lett. , vol.49 , Issue.2 , pp. 91-93
    • Laux, S.E.1    Stern, F.2
  • 7
    • 0033639862 scopus 로고    scopus 로고
    • Computational issues in the simulation of semiconductor quantum wires
    • Trellakis A., Ravaioli U. Computational issues in the simulation of semiconductor quantum wires. Comp. Meth. Appl. Mech. Engrg. 181(4):2000;437-449.
    • (2000) Comp. Meth. Appl. Mech. Engrg. , vol.181 , Issue.4 , pp. 437-449
    • Trellakis, A.1    Ravaioli, U.2
  • 9
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    • Computer simulation and measurement of capacitance-voltage characteristics in quantum wire devices of trench-oxide MOS structure
    • Tsukui T., Oda S. Computer simulation and measurement of capacitance-voltage characteristics in quantum wire devices of trench-oxide MOS structure. Jpn. J. Appl. Phys. 34(12B):1995;874-877.
    • (1995) Jpn. J. Appl. Phys. , vol.34 , Issue.12 B , pp. 874-877
    • Tsukui, T.1    Oda, S.2
  • 10
    • 0003920388 scopus 로고    scopus 로고
    • Advanced physical models for silicon device simulation
    • S. Selberherr. Wien: Springer
    • Schenk A. Advanced physical models for silicon device simulation. Selberherr S. Computational microelectronics. 1998;320 Springer, Wien.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.