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Volumn 24, Issue 3, 2003, Pages 593-599

Properties of flexible DLC film deposited by amplitude-modulated RF p-CVD

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; DEFORMATION; FRICTION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RESINS; RUBBER; SUBSTRATES; WEAR OF MATERIALS;

EID: 0344897717     PISSN: 01966219     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1002/9780470294802.ch84     Document Type: Conference Paper
Times cited : (3)

References (6)
  • 1
    • 0015080715 scopus 로고
    • Physics of ion plating and ion beam deposition
    • S. Aisenberg and R. Chabot: Physics of ion plating and ion beam deposition, J. Appl. Phys., 42, 2953-58 (1971)
    • (1971) J. Appl. Phys. , vol.42 , pp. 2953-2958
    • Aisenberg, S.1    Chabot, R.2
  • 2
    • 0019621815 scopus 로고
    • Structural investigation of thin films of diamondlike carbon
    • H. Vora and T. J. Moravia: Structural investigation of thin films of diamondlike carbon, J. Appl. Phys., 52, 6151-57 (1981)
    • (1981) J. Appl. Phys. , vol.52 , pp. 6151-6157
    • Vora, H.1    Moravia, T.J.2
  • 5
    • 0030672217 scopus 로고    scopus 로고
    • Properties of a-Si:H film deposited by amplitude-modulated RF plasma chemical vapour deposition for thin film transistor
    • T. Nakahigashi, T. Hayashi, Y. Izumi, M. Kobayashi, H. Kuwahara and M. Nakabayashi, "Properties of a-Si:H Film Deposited by Amplitude-Modulated RF Plasma Chemical Vapour Deposition for Thin Film Transistor", Jpn. J. Appl. Phys. 36, 328-34 (1997)
    • (1997) Jpn. J. Appl. Phys. , vol.36 , pp. 328-334
    • Nakahigashi, T.1    Hayashi, T.2    Izumi, Y.3    Kobayashi, M.4    Kuwahara, H.5    Nakabayashi, M.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.