Photoelasticity of crystalline and amorphous silica from first principles

Physical Review B - Condensed Matter and Materials Physics

Volumn 68, Issue 13, 2003, Pages

  Donadio, D ^a   Bernasconi, M ^a   Tassone, F ^b  

^a Istituto Nazionale per la Fisica della Materia Milan   (Italy)

^b Pirelli Labs SpA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIN; SILICON DIOXIDE;

ARTICLE; COVALENT BOND; DENSITY; ELASTICITY; MATHEMATICAL COMPUTING; MOLECULAR DYNAMICS; PRESSURE; THEORETICAL MODEL;

EID: 0344872512     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.68.134202     Document Type: Article

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