Synthesis of copolymers containing 3-hydroxycyclohexyl methacrylate and their application as ArF excimer laser resists

Polymer

Volumn 40, Issue 1, 1999, Pages 273-276

  Kim, Jin Baek ^a   Kim, Jae Young ^a   Jung, Min Ho ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

3 hydroxycyclohexyl methacrylate; Alicyclic methacrylate; Arf photoresist

Indexed keywords

ADHESION; AMMONIUM COMPOUNDS; DRY ETCHING; EXCIMER LASERS; FLUORINE COMPOUNDS; PHOTOLITHOGRAPHY; PHOTORESISTS; POLYACRYLATES; SYNTHESIS (CHEMICAL);

POLYHYDROXYCYCLOHEXYL METHACRYLATE; TETRAMETHYLAMMONIUM HYDROXIDE;

TERPOLYMERS;

EID: 0032888824     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0032-3861(98)00218-3     Document Type: Article

References (11)

1. Kaimoto Y, Nozaki K, Takechi S, Abe N. Proc SPIE 1992; 1672:66.
2. Takechi S, Takahashi M, Kotachi A, Nozaki K, Yano E, Hanyu I. J Photopolym Sci Technol 1996;9:475.
3. Shida N, Ushirogouchi T, Asakawa K, Nakase M. J Photopolym Sci Technol 1996;9:457.
4. Allen RD, Wallraff GM, Dipietro RA, Hofer DC, Kunz RR. Proc SPIE 1995;2438:474.
5. Nakano K, Maeda K, Iwasa S, Yano J, Ogura Y, Hasegawa E. Proc SPIE 1994;2195:195.
6. Maeda K, Nakano K, Ohfuji T, Hasegawa E. Proc SPIE 1996;2724:377.
7. Dekar JL, Hacker NP. J Am Chem Soc 1990;112:6004.
8. Wildi BS, Taylor SW, Potratz HA. J Am Chem Soc 1965;1951:73.
9. Crivello JV, Lam JHW. J Org Chem 1978;43:3055.
10. Owens DK, Wendt RC. J Appl Polym Sci 1969;13:1741.
11. Young T. Trans Roy Soc 1805;95:84.