Fabrication of field emitter arrays with hydrogenated amorphous silicon on glass

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6620-6622

  Gamo, Hidenori ^b   Kanemaru, Seigo ^a   Itoh, Junji ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b TOPPAN PRINTING CO LTD   (Japan)

Author keywords

Amorphous silicon; Field emission display; Field emitter array; Hydrogenated amorphous silicon; Plasma enhanced chemical vapor deposition; Vacuum microelectronics

Indexed keywords

EID: 0344548845     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6620     Document Type: Article

References (5)

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5. H. H. Busta, J. E. Pogemiller and B. J. Zimmerman: J. Vac. Sci. Technoi. B 12 (1994) 689.