Amorphous-silicon-on-glass field emitter arrays

IEEE Electron Device Letters

Volumn 17, Issue 6, 1996, Pages 261-263

  Gamo, Hidenori ^a   Kanemaru, Seigo ^b   Itoh, Junji ^b  

^a TOPPAN PRINTING CO LTD   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CHROMIUM; ELECTRIC CONDUCTIVITY; ELECTRIC CURRENTS; ELECTROCHEMICAL ELECTRODES; ELECTRON EMISSION; EVAPORATION; SEMICONDUCTING GLASS; SPUTTER DEPOSITION; THICK FILMS; X RAY DIFFRACTION;

EMISSION CURRENT; FIELD EMITTER ARRAYS; THRESHOLD VOLTAGE; VACUUM EVAPORATION; X RAY DIFFRACTION PATTERNS;

FIELD EMISSION CATHODES;

EID: 0030170553     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.496451     Document Type: Article

References (6)

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