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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 9 A, 2003, Pages 5602-5606

Proximity correction for fabricating a chirped diffraction grating by direct-writing electron-beam lithography

(5) Okano, Masato a Kikuta, Hisao b Hirai, Yoshihiko b Yamamoto, Kazuya a Yotsuya, Tsutom c

a NALUX Co Ltd (Japan)

b Osaka Prefecture University (Japan)

c OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE (Japan)

Author keywords

Diffraction grating; Electron beam lithography; Proximity correction; Resist development simulator

Indexed keywords

BOUNDARY CONDITIONS; CALCULATIONS; COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON SCATTERING; INTERPOLATION; MONTE CARLO METHODS; OPTICAL FIBER FABRICATION;

CHIRPED DIFFRACTION GRATING; DIRECT-WRITING ELECTRON BEAM LITHOGRAPHY; ELECTRON DOSE DISTRIBUTION; PROXIMITY CORRECTION;

DIFFRACTION GRATINGS;

EID: 0344494544 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.42.5602 Document Type: Article

Times cited : (3)

References (13)

1
- 84975661827
- T. Fujita, H. Nishihara and J. Koyama: Opt. Lett. 6 (1981) 613.
- (1981) Opt. Lett. , vol.6 , pp. 613
- Fujita, T.¹ Nishihara, H.² Koyama, J.³

2
- 84975647298
- T. Shiono and H. Ogawa: Appl. Opt. 30 (1991) 3643.
- (1991) Appl. Opt. , vol.30 , pp. 3643
- Shiono, T.¹ Ogawa, H.²

3
- 5344257623
- E. Di Fabrizio, L. Grella, M. Baciocchi, M. Gentili, D. Peschiaroli, L. Mastrogiacomo and R. Maggiora: J. Vac. Sci. Technol. B 14 (1996) 3855.
- (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 3855
- Di Fabrizio, E.¹ Grella, L.² Baciocchi, M.³ Gentili, M.⁴ Peschiaroli, D.⁵ Mastrogiacomo, L.⁶ Maggiora, R.⁷

4
- 0031389573
- E.-B. Kley: Microel. Eng. 34 (1997) 261.
- (1997) Microel. Eng. , vol.34 , pp. 261
- Kley, E.-B.¹

5
- 0010262152
- W. Daschner, M. Larsson and S. H. Lee: Appl. Opt. 34 (1995) 2534.
- (1995) Appl. Opt. , vol.34 , pp. 2534
- Daschner, W.¹ Larsson, M.² Lee, S.H.³

6
- 0000573712
- P. D. Maker and R. E. Muller: J. Vac. Sci. Technol. B 10 (1992) 2516.
- (1992) J. Vac. Sci. Technol. B , vol.10 , pp. 2516
- Maker, P.D.¹ Muller, R.E.²

7
- 0029253099
- F. Nikolajeff, J. Bengtsson, M. Larsson, M. Ekberg and S. Hard: Appl. Opt. 34 (1995) 897.
- (1995) Appl. Opt. , vol.34 , pp. 897
- Nikolajeff, F.¹ Bengtsson, J.² Larsson, M.³ Ekberg, M.⁴ Hard, S.⁵

8
- 0345185079
- [in Japanese]
- M. Okano, K. Yamamoto, T. Yotsuya, Y. Hirai and H. Kikuta: Jpn. J. Opt. 29 (2000) 566 [in Japanese].
- (2000) Jpn. J. Opt. , vol.29 , pp. 566
- Okano, M.¹ Yamamoto, K.² Yotsuya, T.³ Hirai, Y.⁴ Kikuta, H.⁵

9
- 0034430659
- Y. Hirai, H. Kikuta, M. Okano, T. Yotsuya and K. Yamamoto: Jpn. J. Appl. Phys. 39 (2000) 6831.
- (2000) Jpn. J. Appl. Phys. , vol.39 , pp. 6831
- Hirai, Y.¹ Kikuta, H.² Okano, M.³ Yotsuya, T.⁴ Yamamoto, K.⁵

10
- 0026170017
- Y. Hirai, S. Tomida, K. Ikeda, M. Sasago, M. Endo, S. Hayama and N. Nomura: IEEE Trans. CAD 10 (1991) 802.
- (1991) IEEE Trans. CAD , vol.10 , pp. 802
- Hirai, Y.¹ Tomida, S.² Ikeda, K.³ Sasago, M.⁴ Endo, M.⁵ Hayama, S.⁶ Nomura, N.⁷

11
- 0016081654
- D. F. Kyser and K. Murata: IBM J. Res. Develop. 18 (1974) 352.
- (1974) IBM J. Res. Develop. , vol.18 , pp. 352
- Kyser, D.F.¹ Murata, K.²

12
- 0016529979
- F. H. Dill, A. R. Neureuther, J. A. Tuttle and E. J. Walker: IEEE Trans. Electron Devices 22 (1975) 456.
- (1975) IEEE Trans. Electron Devices , vol.22 , pp. 456
- Dill, F.H.¹ Neureuther, A.R.² Tuttle, J.A.³ Walker, E.J.⁴

13
- 0018454953
- A. R. Neureuther, D. F. Kyser and C. H. Ting: IEEE Trans. Electron Devices 26 (1979) 686.
- (1979) IEEE Trans. Electron Devices , vol.26 , pp. 686
- Neureuther, A.R.¹ Kyser, D.F.² Ting, C.H.³

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