Multiproject wafers: Not just for million-dollar mask sets

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5043, Issue , 2003, Pages 100-113

  Morse, Richard D ^a  

^a Morse Consulting Services   (United States)

Author keywords

Chip finishing; Cost reduction; Data management; Data prep; Frame generation; Lithography; Mask engineering; MPC; MPW; Multiproject wafers; Prototype; Semiconductor; Tapeout

Indexed keywords

COSTS; ELECTRONICS INDUSTRY; INDUSTRIAL ECONOMICS; MASKS; SILICON WAFERS; SOFTWARE PROTOTYPING; TECHNOLOGICAL FORECASTING;

MULTIPROJECT WAFERS; RETICLE ENHANCEMENT TECHNOLOGY;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0344440781     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.497667     Document Type: Conference Paper

References (13)

1. Jorge Freyer, "The Impact of the Photomask on Design", Electronic News, June 3, 2002
2. Gordon E. Moore, "Our Revolution", SIA Awards Dinner presentation, 2002 http://www.sia-online.org/downloads/Moore.pdf
3. Lynn Conway, The MPC Adventures at Xerox PARC, Xerox PARC Tech. Report VLSI-81-2 http://ia.eecs.umich.edu/~mirror/MPCAdv/MPCAdv.html
4. M. Marshall, L. Waller, H. Wolff, "For optimal VLSI design efforts, Mead and Conway have fused device fabrication and system-level architecture", Electronics, October 20, 1981 http://ai.eecs.umich.edu/people/conway/Awards/Electronics/ElectAchiev.html
5. C. A. Mead and L. Conway, An Introduction to VLSI Systems, Addison-Wesley, 1980
6. International Technology Roadmap for Semiconductors (ITRS) 2002 (update), 2002. http://www.sematech.org
7. Mark LaPedus, "Is IC industry heading to the $10 million photomask?", Semiconductor Business News, October 7, 2002 http://www.siliconstrategies.com/story/OEG20021007S0053
8. Kurt Kimmel, "2002 Mask Industry Assessment", Proceedings of the 22nd Annual BACUS Symposium on Photomask Technology, Vol. 4889, pp. 1-14, October 2-4, 2002
9. Brian Grenon et al., "The Impact of Nanomachining Defect Repair on Photomask Cost", Semiconductor International, February 1 2003 http://www.e-insite.net/semiconductor/index.asp?layout=article&rticleId=CA27 445
10. SEMATECH Mask Supply Workshop, October 1, 2002 http;//www.sematech.org/public.resources/litho/mask/msw1001/output.htm
11. Ruth Dejule, "What's Behind Rising Mask Costs?", Semiconductor International, September 1, 1999 http;//www.e-insite.net/semiconductor/index.asp?layout=article&articleid=CA1 67355
12. Gartner Dataquest presentation from the late 1990s
13. R. Morse, "Highly versatile tapeout automation system", 21st Annual BACUS Symposium on Photomask Technology, Vol. 4562 pp. 206-212, October 3-5, 2001