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Volumn 3223, Issue , 1997, Pages 10-16
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SAMPLE (Sandia Agile MEMS Prototyping, Layout tools, and Education)
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Author keywords
Chemical mechanical polishing (CMP); Microelectromechanical systems (MEMS); Silicon micromachining; Surface micromachining
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Indexed keywords
AGILE MANUFACTURING SYSTEMS;
CHEMICAL MECHANICAL POLISHING;
CHEMICAL POLISHING;
CURRICULA;
ELECTROMECHANICAL DEVICES;
MACHINING;
MECHATRONICS;
MEMS;
MICROANALYSIS;
MICROELECTROMECHANICAL DEVICES;
MICROFABRICATION;
MICROMACHINING;
MICROMECHANICS;
NANOTECHNOLOGY;
POLISHING;
POLYSILICON;
SURFACE MICROMACHINING;
TECHNOLOGY;
DESIGN RULES;
MICROELECTROMECHANICAL SYSTEMS (MEMS);
MICROMACHINES;
MICROMACHINING TECHNOLOGIES;
PLANAR STRUCTURES;
PLANARIZATION;
POLYSILICON LAYERS;
PROTOTYPING;
SACRIFICIAL OXIDES;
SILICON MICROMACHINING;
COMPOSITE MICROMECHANICS;
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EID: 0344411528
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.284476 Document Type: Conference Paper |
Times cited : (3)
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References (6)
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