Effect of process parameters on glow discharge and film thickness uniformity in facing target sputtering

Thin Solid Films

Volumn 292, Issue 1-2, 1997, Pages 20-25

  Senthil Nathan, S ^a   Muralidhar, G K ^a   Mohan Rao, G ^a   Mohan, S ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

Glow discharge; Sputtering

Indexed keywords

ELECTRIC CURRENTS; FILM PREPARATION; GLOW DISCHARGES; PLASMAS; PRESSURE; SILVER; SPUTTERING; SUBSTRATES; TARGETS; THICKNESS CONTROL;

FACING TARGET SPUTTERING; INTERTARGET DISTANCE;

THIN FILMS;

EID: 0031553480     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0040-6090(96)08928-6     Document Type: Article

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