Implantation profiles for low energy electrons in metals: Scaling properties

Applied Surface Science

Volumn 221, Issue 1-4, 2004, Pages 114-119

  Chaoui, Z ^a   Bouarissa, N ^b  

^a FERHAT ABBAS UNIVERSITY   (Algeria)

^b UNIVERSITY OF M'SILA   (Algeria)

Author keywords

Electron implantation; Low energy electrons; Monte Carlo scheme

Indexed keywords

APPROXIMATION THEORY; COMPUTER SIMULATION; DIFFUSION; ELECTRON BEAMS; MONTE CARLO METHODS; MULTILAYERS; SURFACE PHENOMENA; SURFACES;

ELECTRON IMPLANTATION; INCIDENT ENERGIES;

ELECTRON ENERGY LEVELS;

EID: 0344308630     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00870-5     Document Type: Article

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