Slow electrons impinging on dielectric solids. II. Implantation profiles, electron mobility, and recombination processes

Physical Review B - Condensed Matter and Materials Physics

Volumn 56, Issue 4, 1997, Pages 2241-2247

  Miotello, Antonio ^a   Dapor, Maurizio ^b  

^a UNIVERSITY OF TRENTO   (Italy)

^b FONDAZIONE BRUNO KESSLER   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000577875     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.56.2241     Document Type: Article

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