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Applied Surface Science

Volumn 144-145, Issue , 1999, Pages 188-191

Quantitative analysis of a-Si 1 - X C x :H thin films

(5) Gracin, D a Jaksic M a Yang, C b Borjanovic V c Pracek B d

a RUDER BO KOVI INSTITUTE (Croatia)

b NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

c UNIVERSITY OF ZAGREB (Croatia)

d Institute of Surface Engineering and Optoelectronics Ljubljana (Slovenia)

Author keywords

Amorphous films; Auger spectroscopy; Backscattering; Carbon content; FTIR spectroscopy; Hydrogen content

Indexed keywords

AMORPHOUS SILICON; AUGER ELECTRON SPECTROSCOPY; CARBON; CHEMICAL BONDS; COMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; HYDROGENATION; MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION;

ELASTIC RECOIL DETECTION ANALYSIS; MATRIX EFFECTS;

THIN FILMS;

EID: 0344210965 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(98)00795-8 Document Type: Article

Times cited : (10)

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