EUCLIDES: European EUV lithography milestones

Solid State Technology

Volumn 42, Issue 9, 1999, Pages

  Benschop, Jos P H ^a   Van Dijsseldonk, Anton J J ^a   Kaiser, Winfried M ^b   Ockwell, David C ^c  

^a ASML   (Netherlands)

^b CARL ZEISS SMT AG   (Germany)

^c OXFORD INSTRUMENTS PLASMA TECHNOLOGY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; BENCHMARKING; COMPUTATIONAL METHODS; MATHEMATICAL MODELS; OPTIMIZATION; RESEARCH AND DEVELOPMENT MANAGEMENT; RISK MANAGEMENT; SUBSTRATES; THROUGHPUT;

HIGH SPATIAL FREQUENCY ROUGHNESS (HSFR); MID-SPATIAL FREQUENCY ROUGHNESS (MSFR);

PHOTOLITHOGRAPHY;

EID: 0344183075     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (11)

1. Jos P. H. Benschop, Winfried M. Kaiser, David C. Ockwell. " EUCLIDES, the European EUVL program," to be published in the SPIE 3676 Symposium on Mircrolithography 1999.
2. R.H. Stulen et al., "Progress in the development of extreme ultraviolet lithography," to be published in the SPIE 3676 Symposium on Mircrolithography 1999.
3. S. Okazaki, "EUV program in Japan," to be published in the SPIE 3676 Symposium on Mircrolithography 1999.
4. L. Rymell, H.M.Hertz, "Droplet target for low-debris laser-plasma soft X-ray generation," Optics Communications, 103, pp. 105-110, 1993.
5. Jeroen Jonkers et al., "Laser produced oxygen plasmas," to be published in The Annals of the New York Academy of Sciences (Proceedings of 2nd International Symposium on Heat and Mass Transfer under Plasma Conditions, ed. by P. Fauchais), 1999.
6. H.M. Hertz et al., "Debris-free soft x-ray generation using a liquid droplet laser-plasma target," in Applications of laser plasma radiation II, SPIE, 2523:,88-93, 1995.
7. Matthieu Visser, Martijn Dekker, Petra Hegeman, Joseph Braat, "Extended-source interferometry for at-wavelength test of EUV-optics," to be published in the SPIE 3676 Symposium on Mircrolithography 1999.
8. European Patent EP 0455 218 B1.
9. Eric Louis et al., "Reflectivity of Mo/Si multilayer system for EUVL," to be published in the SPIE 3676 Symposium on Microlithography 1999.
10. D.C. Ockwell, N.C.E Crosland, V.C. Kempson, "A synchrotron light source for EUV lithography," to be published in these proceedings.
11. L.G. Lesoine, J. Leavey, "IBM advanced lithography facility: The first five years," Solid State Technology, July 1998.