Technology and properties of magnetron sputtered CuInSe2 layers

Materials Chemistry and Physics

Volumn 82, Issue 3, 2003, Pages 905-910

  Vassilev, G P ^a   Docheva, P ^b   Nancheva, N ^b   Arnaudov, B ^a   Dermendjiev, I ^b  

^a UNIVERSITY OF SOFIA   (Bulgaria)

^b UNIVERSITY OF RUSE   (Bulgaria)

Author keywords

CuInSe2 phase; Magnetron sputtering; Thin layers

Indexed keywords

COMPOSITION; INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; PHASE TRANSITIONS; SUBSTRATES; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION;

MULTICOMPONENT LAYERS; VACANCY CLUSTERS;

COPPER COMPOUNDS;

EID: 0344084094     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2003.08.005     Document Type: Article

References (29)

1. Marsillac S., Combot-Marie A.M., Bernede J.C., Conan A. Thin Solid Films. 288:1996;14.
2. Tedenac J.-C., Vassilev G.P., Daouchi B., Rachidi J., Brun G. Crystallogr. Res. Technol. 32:1997;605.
3. Vassilev G.P. Bulg. Chem. Commun. (Sofia). 29:1996-1997;715.
4. Vassilev G.P., Daouchi B., Record M.C., Tedenac J.-C. JALCOM. 269:1998;107.
5. G.P. Vassilev, Proceedings of the Seminar on Thermodynamics of Materials, Brno, November 2001, CAFF-Studie, Brno, 2001, p. 12. ISBN 80-210-2702-9.
6. Daouchi B., Record M.C., Tedenac J.-C., Vassilev G.P. Z. MeHallkunde. 89:1998;612.
7. Meese J.M., Manthurathil J.C., Locker D.R. Bull. Am. Phys. Soc. 20:1975;696.
8. Stolt L., Hedstrom J., Kesler J., Ruckh M., Velthaus K.O., Schock H.W. Appl. Phys. Lett. 62:1993;597.
9. Lokhande C.D., Pawar S.H. Phys. Stat. Sol. (a). 111:1989;17.
10. Isomura T., Kariya T., Shirakata S. Crystallogr. Res. Technol. 31:1996;523.
11. Hermann A.M., Westfall R., Wind R. Solar Energy Mater. Solar Cells. 52:1998;355.
12. Thornton J., Cornog D. J. Vac. Sci. Technol. A. 2:1984;307.
13. Thornton J., Lommasson T., Talieh H., Tseng B. Solar Cells. 24:1988;1.
14. Ramakrishna Reddy K.T., Forbes I., Miles R.W., Carter M.J., Dutta P.K. Mater. Lett. 37:1998;57.
15. El Soud A., Zayed H.A., Soliman L.A. Thin Solid Films. 229:1993;232.
16. Rockett A., Lommasson T.C., Campos P., Yang I., Talieh H. Thin Solid Films. 171:1989;109.
17. Zhang S.B., Wei S.-H., Zunger A. J. Appl. Phys. 83:1998;3192.
18. Klein A., Jaegermann W. Appl. Phys. Lett. 74:1999;2283.
19. Djourelov N., Misheva M. J. Phys.: Condens. Mat. 8:1996;2081.
20. Kirkegaad P., Eldrub M., Mogensen O.E., Pedersen N.J. Comp. Phys. Commun. 23:1981;307.
21. Popov D., Docheva P., Navassardjan S. Bulg. J. Phys. 15:1988;451.
22. J.L. Vossen, W. Kern, Thin Film Processes, Academic Press, New York, 1978.
23. JCPDS-ICDD, Powder Diffraction, 1995.
24. Kazmerski L., Ayyagari M., Sanborn G. J. Appl. Phys. 46:1975;4865.
25. Cotterill R.M.J., MacKenzie I.K., Smedskjaer L., Trumpy G., Traff J. Nature. 239:1972;99.
26. Seeger A., Banhart F. Phys. Stat. Sol. (a). 102:1987;171.
27. A. Seeger, F. Banhart, W. Brauer, in: L. Dorikens-Vanpraet, M. Dorikens, D. Segers (Eds.), Positron Annihilation, Word Scientific, Singapore, 1989, p. 275.
28. Polity A., Krause-Rehberg R., Staab T.E.M., Puska M.J., Klais J., Moller H.J., Meyer B.K. J. Appl. Phys. 83:1998;71.
29. Klais J., Möller H.J., Cahen D. Thin Solid Films. 361-362:2000;446.