SIMS: From research to production control

Surface and Interface Analysis

Volumn 35, Issue 11, 2003, Pages 859-879

  Werner, Helmut W ^a,b  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Depth analysis; Fingerprint spectra; Limit of detection; Quantitative analysis; SIMS; Statistical process control; ULSI; Wafer analysis

Indexed keywords

ION BOMBARDMENT; OPTIMIZATION; PRODUCTION CONTROL; SILICON WAFERS; SOLIDS; SPUTTERING; STATISTICAL PROCESS CONTROL; ULSI CIRCUITS;

DEPTH RESOLUTION; ENERGETIC IONS; ION DETECTION; LATERAL RESOLUTION; TIME OF FLIGHT MASS SPECTROMETERS;

SECONDARY ION MASS SPECTROMETRY;

EID: 0344036286     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1569     Document Type: Article

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