Application of RF sensors for real time control of inductively coupled plasma etching equipment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3213, Issue , 1997, Pages 64-72

  Patrick, Roger ^a   Williams, Norman ^a   Lee, Chii Guang ^a  

^a LAM RESEARCH CORPORATION   (United States)

Author keywords

Plasma etching; Power control; RF sensor

Indexed keywords

BIAS POWERS; CLOSED-LOOP CONTROLS; INDUCTIVELY COUPLED PLASMA ETCHINGS; MATCHING NETWORKS; METAL ETCHINGS; OPEN LOOPS; OVERALL EFFICIENCIES; POWER DEPOSITIONS; POWER SUPPLIES; RADIO FREQUENCIES; REAL TIMES; RF SENSOR; RF SYSTEMS; SENSOR OUTPUTS; WAFER SURFACES;

BEAMFORMING; CLOSED LOOP CONTROL SYSTEMS; ETCHING; INDUCTIVELY COUPLED PLASMA; INTEGRATED CIRCUITS; PLASMA ETCHING; PLASMAS; POWER CONTROL; RADIO EQUIPMENT; REAL TIME CONTROL; REAL TIME SYSTEMS; SENSORS; TOKAMAK DEVICES; TRANSMISSION CONTROL PROTOCOL;

SENSOR NETWORKS;

EID: 0343957154     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.284650     Document Type: Conference Paper

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